Cerium Oxide Film Growth Using Radio-Frequency Sputtering Process

ISSN Print: 2153-117X
ISSN Online: 2153-1188
www.scirp.net/journal/msa
E-mail: [email protected]

Citations

"Cerium Oxide Film Growth Using Radio-Frequency Sputtering Process"
written by Pao-Chi Chen, Xiao An Wang,
published by Materials Sciences and Applications, Vol.11 No.5, 2020

has been cited by the following article(s):

[1]	A Review on the effects of PVD RF sputtering parameters on rare earth oxide thin films and their applications
	2021

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[2]	Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionate) Cerium for the Deposition of Hydrophobic Coatings Langmuir, 2025 DOI:10.1021/acs.langmuir.5c01723

[3]	Influence of power and duration on RF sputtering for the formation of terbium oxide passivation layers via the argon ambient Journal of Materials Science: Materials in Electronics, 2024 DOI:10.1007/s10854-024-12717-y

[4]	A Review on the effects of PVD RF sputtering parameters on rare earth oxide thin films and their applications IOP Conference Series: Materials Science and Engineering, 2021 DOI:10.1088/1757-899X/1166/1/012022